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Oct 11, 2026 3 min

Stress Maps, Not Single Numbers

from Professor Alex Volinsky

Got something to say to this podcast? Send a voicemail, and you might hear yourself on the next episode! Episode 113 of the Professor Alex Volinsky podcast. Every deposited SiC film carries residual stress, and Stoney's 1909 equation reads it as one number for the whole wafer — but real deposition is non-uniform, and the stress concentrations that crack films hide near the wafer edge. Nonparametric estimation lets the data decide the stress field's shape. Based on the paper: Nonparametric Estimation of SiC Film Residual Stress from the Wafer Surface Profile; O. Savchuk, A.A. Volinsky; Measurement, 2021, Vol. 177, 109238. Hosts Elena and Marcus. AI-generated voices.

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Stress Maps, Not Single Numbers

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